Electron projection lithography using secondary electron,申请号KR20020064548-传众专利搜索

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发明名称	Electron projection lithography using secondary electron
摘要
申请公布号	KR100513720(B1)	申请公布日期	2005.09.07
申请号	KR20020064548	申请日期	2002.10.22
申请人		发明人
分类号	G03F7/20;H01J1/00;H01J31/00;H01J37/073;H01J37/147;H01J37/305;H01J37/317;H01L21/027;(IPC1-7):G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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