SLURRY COMPOSITION FOR SECONDARY POLISHING OF SILICON WAFER,申请号EP20030812702-传众专利搜索

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发明名称	SLURRY COMPOSITION FOR SECONDARY POLISHING OF SILICON WAFER
摘要
申请公布号	EP1570512(A1)	申请公布日期	2005.09.07
申请号	EP20030812702	申请日期	2003.07.30
申请人	CHEIL INDUSTRIES INC.	发明人	ROH, HYUN, SOO;PARK, TAE, WON;LEE, KILL, SUNG;LEE, IN, KYUNG
分类号	C09G1/02;H01L21/304;B24B37/00;B82Y10/00;B82Y99/00;C09K3/14;H01L21/306;(IPC1-7):H01L21/304	主分类号	C09G1/02
代理机构		代理人
主权项
地址

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