发明名称 |
Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method, and semiconductor manufacturing factory |
摘要 |
A scanning exposure apparatus for exposing a substrate to a pattern includes an exposure system which exposes the substrate to the pattern with respect to a unit region of the substrate to which the pattern is transferred, a determination system which determines whether a condition of an exposure performed by the exposure system is allowable during the exposure, and a control system which causes the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the determination system makes a negative determination for the unit region.
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申请公布号 |
US6940584(B2) |
申请公布日期 |
2005.09.06 |
申请号 |
US20030676156 |
申请日期 |
2003.10.02 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KUROSAWA HIROSHI |
分类号 |
G01B11/00;G01B11/26;G03B27/52;G03F7/20;G03F7/207;G03F9/00;G21K5/04;H01L21/027;(IPC1-7):G03B27/42 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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