发明名称 Equipment for communication system and semiconductor integrated circuit device
摘要 Equipment for a communication system has a semiconductor device formed by integrating a Schottky diode, a MOSFET, a capacitor, and an inductor in a SiC substrate. The SiC substrate has a first multilayer portion and a second multilayer portion provided upwardly in this order. The first multilayer portion is composed of delta-doped layers each containing an n-type impurity (nitrogen) at a high concentration and undoped layers which are alternately stacked. The second multilayer portion is composed of delta-doped layers each containing a p-type impurity (aluminum) at a high concentration and undoped layers which are alternately stacked. Carriers in the delta-doped layers spread out extensively to the undoped layers. Because of a low impurity concentration in each of the undoped layers, scattering by impurity ions is reduced so that a low resistance and a high breakdown voltage are obtained.
申请公布号 US6940127(B2) 申请公布日期 2005.09.06
申请号 US20030631086 申请日期 2003.07.31
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 YOKOGAWA TOSHIYA;TAKAHASHI KUNIMASA;UCHIDA MASAO;KITABATAKE MAKOTO;KUSUMOTO OSAMU
分类号 H01L21/82;H01L27/06;H01L29/10;H01L29/15;H01L29/24;H01L29/36;H01L29/772;H01L29/812;H01L29/872;H03D7/12;H03F3/60;(IPC1-7):H01L29/76 主分类号 H01L21/82
代理机构 代理人
主权项
地址