发明名称 Vertical NROM and methods for making thereof
摘要 Vertical NROM devices are made in a substantially single crystalline silicon substrate having a planar surface. The vertical NROM cell and device has a first region and a second region spaced apart from one another by a channel. A dielectric is spaced apart from the channel to capture charges injected from the channel onto the dielectric. A gate is positioned over the dielectric and spaced apart therefrom and controls the flow of current through the channel. In the improvement of the present invention, a portion of the channel is substantially perpendicular to the top planar surface of the substrate. Methods for making the vertical NROM cell and array are also disclosed.
申请公布号 US6940125(B2) 申请公布日期 2005.09.06
申请号 US20030407627 申请日期 2003.04.04
申请人 SILICON STORAGE TECHNOLOGY, INC. 发明人 KIANIAN SOHRAB;LEE DANA
分类号 H01L21/8246;H01L27/115;H01L29/792;(IPC1-7):H01L29/76 主分类号 H01L21/8246
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