发明名称 |
SELECTIVE ETCHING OF A PROTECTIVE LAYER |
摘要 |
An electron-emitting device including a protective layer that is formed on a catalyst layer to protect the catalyst layer from the deleterious environmental conditions before or during a cathode process. The present invention further includes a half etching process that is adapted to partially remove portions of the protective layer from the catalyst layer to etch the catalyst layer except carbon nano-tube growing portions. Portions of the protective layer still remain on the catalyst layer to protect the catalyst layer from the deleterious conditions from next cathode formation process.
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申请公布号 |
KR20050088394(A) |
申请公布日期 |
2005.09.05 |
申请号 |
KR20057011310 |
申请日期 |
2005.06.17 |
申请人 |
CDREAM DISPLAY CORPORATION;SANYO ELECTRIC CO., LTD. |
发明人 |
SONG, JONG WOO;CHANG, CHUL HA;KIM, JUNG JAE;SUZUKI KOJI;KUWAHARA TAKASHI |
分类号 |
C01B31/02;H01J9/02;H01L21/3213;(IPC1-7):H01J1/304 |
主分类号 |
C01B31/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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