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发明名称
使用井偏压修正的积体电路测试方法
摘要
测试一半导体电路(10)的方法,包含测试电路及在测试中修正电路之井偏压(14、18)。这些方法藉由在测试中修正井偏压,增进了电压式和静态漏电流(IDDQ)测试及分析的解析度。此外,这些方法提供了在加压测试中更有效率加压。这些方法应用在积体电路中,其中半导体井(井及/或基底)是分别连接到晶片电源电压(VDD)和接地(GND),允许在测试中从外部控制(40)井电位。一般来说,这些方法依靠使用井偏压来改变电晶体临界电压。
申请公布号
TW200528738
申请公布日期
2005.09.01
申请号
TW093104347
申请日期
2004.02.20
申请人
万国商业机器公司
发明人
安E 贾提柯;大卫A 葛罗许;马克D 诺克斯;法兰柯 摩提卡;菲尔 奈;裘蒂 范 宏恩;保罗S 祖裘斯基
分类号
G01R31/303;G01R31/26
主分类号
G01R31/303
代理机构
代理人
蔡玉玲
主权项
地址
美国
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