POLYMER, PHOTORESIST COMPOSITION CONTAINING THE POLYMER, AND METHOD OF FORMING RESIST PATTERN

摘要

A polymer which, in a chemical amplification type positive resist system, changes considerably in alkali solubility through exposure to light; a photoresist composition which contains the polymer and can form a fine pattern having high resolution; and a method of forming a resist pattern. The photoresist composition and the method of resist pattern formation employ the polymer, which has as an alkali-soluble group (i) at least one substituent selected among alcoholic hydroxy, carboxy, and phenolic hydroxy and in which the substituent has been protected by an acid-dissociable dissolution-inhibitive group (ii) represented by the following general formula (1): [Chemical formula 1] -CH2-O-R wherein R represents a C20 or lower organic group having at least one hydrophilic group.