| 发明名称 |
Method and system for reducing and monitoring precipitated defects on masking reticles |
| 摘要 |
A method and system is disclosed for reducing and monitoring precipitated defects on mask reticles. A predetermined gas is provided into an environment surrounding the reticle assembly for reducing a formation of the precipitated defects around the mask reticle caused by photolithography under a light source having a small wavelength.
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| 申请公布号 |
US2005191563(A1) |
申请公布日期 |
2005.09.01 |
| 申请号 |
US20040787698 |
申请日期 |
2004.02.26 |
| 申请人 |
DAI YI-MING;LIN TING-YU;LAN HO-KU;TURN LI-KONG;LIU HENG-HSIN;LIU LOUIE;WU TONY;LIAO CHI-HUNG |
发明人 |
DAI YI-MING;LIN TING-YU;LAN HO-KU;TURN LI-KONG;LIU HENG-HSIN;LIU LOUIE;WU TONY;LIAO CHI-HUNG |
| 分类号 |
G03F7/00;G03F7/20;G03F9/00;(IPC1-7):G03F9/00 |
主分类号 |
G03F7/00 |
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