发明名称 X-RAY SOURCE
摘要 The present invention provides an x-ray source including an electron-generation chamber with an electron beam source that emits electrons and a target chamber with a support structure and a target positioned within the support structure. The emitted electrons travel in a direction substantially parallel to a longitudinal axis extending between the electron-generation chamber and the target chamber towards the target and bombard the target to generate x-rays. The target is movable, while being bombarded with electrons, with respect to the support structure in at least one direction perpendicular to a longitudinal axis.
申请公布号 US2005190887(A1) 申请公布日期 2005.09.01
申请号 US20040787264 申请日期 2004.02.26
申请人 OSMIC, INC. 发明人 KIM BONGLEA
分类号 H01J35/14;H01J35/24;H01J35/28;(IPC1-7):H01J35/10 主分类号 H01J35/14
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