发明名称 TWO-DIMENSIONAL LIGHT MODULATION DEVICE, EXPOSURE APPARATUS, AND EXPOSURE METHOD
摘要 A scanning-type maskless exposure apparatus having, as a variable forming mask, a two-dimensional light modulation device capable of moving a formed modulated light distribution in one direction at a high speed. A two-dimensional light modulation device (VM1) is used as a variable forming mask of a scanning-type maskless exposure apparatus. The light modulation device (VM1) has a light modulation element array (11) where light modulation elements each composed of a signal holding element and a light modulation element are two dimensionally arranged and has a control circuit mechanism (12) capable of sequentially sending a light modulation signal, held by a signal holding element, in one direction to an adjacent signal holding element. A light modulation state distribution, as a pattern on the variable forming mask, capable of being sent in one direction is transferred, through a projection optical system (13), on a moving substrate (W) to be exposed.
申请公布号 WO2005081034(A1) 申请公布日期 2005.09.01
申请号 WO2005JP02940 申请日期 2005.02.23
申请人 NIKON CORPORATION;SHIRAISHI, NAOMASA 发明人 SHIRAISHI, NAOMASA
分类号 G02B26/08;G02B27/00;G02F1/01;G03F1/08;G03F7/20;H01L21/027 主分类号 G02B26/08
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