EXPOSURE APPARATUS, SUPPLY METHOD AND RECOVERY METHOD, EXPOSURE METHOD, AND DEVICE PRODUCING METHOD

摘要

An exposure apparatus where its exposure accuracy and measurement accuracy can be prevented from degrading. The exposure apparatus (EX) is an apparatus for exposing a substrate (P) by irradiating exposure light (EL) to the substrate (P) through an optical system (PL) and liquid (LQ). The exposure apparatus (EX) has a liquid supply mechanism (10) for supplying the liquid (LQ) between an optical element (2) at an image surface side head section of the projection optical system (PL) and the substrate (P) facing the optical element (2), a timer (60) for measuring the elapsed time after the liquid supply by the liquid supply mechanism (10) is started, and a control device (CONT) for determining, based on the result of measurement by the timer (60), whether or not a space (SP) including at least the light path of the exposure light (EL) between the optical element (2) and the substrate (P) has been filled with the liquid (LQ).