发明名称 Field effect transistors having multiple stacked channels
摘要 Integrated circuit field effect transistor devices include a substrate having a surface and an active channel pattern on the surface. The active channel pattern includes channels that are stacked upon one another and are spaced apart from one another to define at least one tunnel between adjacent channels. A gate electrode surrounds the channels and extends through the at least one tunnel. A pair of source/drain regions also is provided. Integrated circuit field effect transistors are manufactured, by forming a pre-active pattern on a surface of a substrate. The pre-active pattern includes a series of interchannel layers and channel layers stacked alternately upon each other. Source/drain regions are formed on the substrate at opposite ends of the pre-active pattern. The interchannel layers are selectively removed to form tunnels. A gate electrode is formed in the tunnels and surrounding the channels.
申请公布号 US2005189583(A1) 申请公布日期 2005.09.01
申请号 US20050119786 申请日期 2005.05.02
申请人 发明人 KIM SUNG-MIN;PARK DONG-GUN;LEE CHANG-SUB;CHOE JEONG-DONG;LEE SHIN-AE;KIM SEONG-HO
分类号 H01L21/336;H01L21/8234;H01L29/423;H01L29/78;H01L29/786;(IPC1-7):H01L29/76 主分类号 H01L21/336
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