发明名称 ION IMPLANTER ELECTRODES
摘要 Provided is an ion implanter (1) having a deceleration lens assembly (9) comprising a plurality of electrodes (60, 61, 65) in which one or more of the apertures of the deceleration electrodes (62, 63, 67) are shaped in a manner which can improve performance of the ion implanter. In one embodiment, an electrode aperture (67) is generally elliptical in shape and conforms generally to the shape of the beam (146) passing through the aperture. In another aspect, an axis segment (H) extends 40 % of the length of the aperture from the aperture center (G) to an intermediate point (I1) at the end of the segment. The average width of the aperture measured at each point from the center to the intermediate point is substantially less than the maximum width of the aperture.
申请公布号 WO2005038855(A3) 申请公布日期 2005.09.01
申请号 WO2004US33893 申请日期 2004.10.15
申请人 APPLIED MATERIALS, INC. 发明人 GOLDBERG, RICHARD, DAVID;ARMOUR, DAVID, GEORGE;BURGESS, CHRISTOPHER;MURRELL, ADRIAN, J.
分类号 G21K5/10;H01J37/08;H01J37/12;H01J37/317 主分类号 G21K5/10
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