发明名称 |
ION IMPLANTER ELECTRODES |
摘要 |
Provided is an ion implanter (1) having a deceleration lens assembly (9) comprising a plurality of electrodes (60, 61, 65) in which one or more of the apertures of the deceleration electrodes (62, 63, 67) are shaped in a manner which can improve performance of the ion implanter. In one embodiment, an electrode aperture (67) is generally elliptical in shape and conforms generally to the shape of the beam (146) passing through the aperture. In another aspect, an axis segment (H) extends 40 % of the length of the aperture from the aperture center (G) to an intermediate point (I1) at the end of the segment. The average width of the aperture measured at each point from the center to the intermediate point is substantially less than the maximum width of the aperture. |
申请公布号 |
WO2005038855(A3) |
申请公布日期 |
2005.09.01 |
申请号 |
WO2004US33893 |
申请日期 |
2004.10.15 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
GOLDBERG, RICHARD, DAVID;ARMOUR, DAVID, GEORGE;BURGESS, CHRISTOPHER;MURRELL, ADRIAN, J. |
分类号 |
G21K5/10;H01J37/08;H01J37/12;H01J37/317 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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