发明名称 |
EXPOSURE APPARATUS AND METHOD OF PRODUCING DEVICE |
摘要 |
<p>An exposure apparatus (EX) has an exposure region (E) for irradiating exposure light (EL) to a substrate (W) through an optical system (30) and liquid (LQ) and has a measurement region (A) for acquiring information on the position of the substrate (W) prior to the exposure. The substrate (W) is exposed when moved between the exposure region (E) and the measurement region (A). The exposure apparatus (EX) has an entry shutoff mechanism (60) for preventing a gas (G) in the vicinity of the exposure region (E) from entering into the measurement region (A).</p> |
申请公布号 |
WO2005081291(A1) |
申请公布日期 |
2005.09.01 |
申请号 |
WO2005JP02444 |
申请日期 |
2005.02.17 |
申请人 |
TAKAIWA, HIROAKI;NIKON CORPORATION |
发明人 |
TAKAIWA, HIROAKI |
分类号 |
G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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