发明名称 Process for producing a photovoltaic device
摘要 <p>A photovoltaic device have a pin junction of a p-layer, an i-layer and an n-layer, wherein the p-layer includes a first p-layer and a second p-layer thereover, the first p-layer having a thickness of 5nm or less and being uniformly doped with a p-type impurity, and the second p-layer being formed by decomposition of a gas which does not positively incorporate a p-type impurity. <IMAGE></p>
申请公布号 EP0969523(B1) 申请公布日期 2005.08.31
申请号 EP19990304582 申请日期 1999.06.11
申请人 SHARP KABUSHIKI KAISHA 发明人 KISHIMOTO, KATSUSHI;NAKANO, TAKANORI;SANNOMIYA, HITOSHI;NOMOTO, KATSUHIKO
分类号 H01L31/04;H01L31/075;H01L31/20;(IPC1-7):H01L31/075 主分类号 H01L31/04
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