POLISHING COMPOUND FOR CHEMIMECHANICAL POLISHING AND METHOD FOR POLISHING SUBSTRATE,申请号KR20027001957-传众专利搜索

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发明名称	POLISHING COMPOUND FOR CHEMIMECHANICAL POLISHING AND METHOD FOR POLISHING SUBSTRATE
摘要
申请公布号	KR100510977(B1)	申请公布日期	2005.08.31
申请号	KR20027001957	申请日期	2002.02.15
申请人		发明人
分类号	B24B1/00;(IPC1-7):B24B1/00	主分类号	B24B1/00
代理机构		代理人
主权项
地址

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