发明名称 Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing
摘要 Methods and systems for generating a two-dimensional map of a characteristic at relative or absolute locations of measurement spots on a specimen during polishing are provided. One method includes scanning a specimen with a measurement device during polishing to generate output signals at measurement spots on the specimen. The method may also include determining a characteristic of polishing at the measurement spots from the output signals. In addition, the method may include determining relative or absolute locations of the measurement spots on the specimen. The method may further include generating a two-dimensional map of the characteristic at the relative or absolute locations of the measurement spots on the specimen. In some embodiments, the relative locations of the measurement spots may be determined from a representative scan path of the measurement device and an average spacing between starting points on individual scans.
申请公布号 US6935922(B2) 申请公布日期 2005.08.30
申请号 US20030358106 申请日期 2003.02.04
申请人 KLA-TENCOR TECHNOLOGIES CORP. 发明人 LEHMAN KURT;CHEN CHARLES;ALLEN RONALD L.;SHINAGAWA ROBERT;SETHURAMAN ANANTHA;BEVIS CHRISTOPHER F.;TRIKAS THANASSIS;CHEN HAIGUANG;MENG CHING LING
分类号 B24B37/04;B24B41/04;B24B49/04;B24B49/10;B24B49/12;(IPC1-7):B24D49/00 主分类号 B24B37/04
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