PLASMA PROCESSING SYSTEM AND METHOD AND ELECTRODE PLATE OF PLASMA PROCESSING SYSTEM

摘要

A plasma processing system comprising a processing container (10) which can be set to have a vacuum atmosphere. A first upper electrode (36) is arranged in a ring-shape oppositely to a substrate (W) being processed disposed in the processing container (10). A second upper electrode (38) is arranged on the radially inner side of the first upper electrode (36) while being insulated electrically therefrom. A first power supply section (50) supplies a first high frequency from a first high frequency power supply (52), at a first power level, to the first upper electrode (36). A second power supply section (76) branched from the first power supply section (50) supplies the first high frequency from the first high frequency power supply, at a second power level lower than the first power level, to the second upper electrode (38).