发明名称 Method of fabricating substrates and substrates obtained by this method
摘要 Techniques are shown in which substrates having a first layer of a first material and second layer of a second material, wherein the second material is less noble than the first material, is provided by bonding the first and second layers together with an amorphous layer interposed there between. The amorphous material may be deposited on a bonding face of the first layer, second layer, or both, before the operation of bonding the first and second layers. The layer with less noble material may be a supporting layer and the other layer may be an active layer for forming components in optics, electronics, or opto-electronics. The amorphous layer may be polished before the bonding operation.
申请公布号 US6936482(B2) 申请公布日期 2005.08.30
申请号 US20020320063 申请日期 2002.12.16
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A. 发明人 AUBERTON-HERVE ANDRE
分类号 C23C14/14;H01L21/02;H01L21/762;H01L27/12;H01L31/04;(IPC1-7):H01L21/00 主分类号 C23C14/14
代理机构 代理人
主权项
地址