| 发明名称 |
Process for the decontamination of microlithographic projection exposure devices |
| 摘要 |
UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.
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| 申请公布号 |
US6936825(B2) |
申请公布日期 |
2005.08.30 |
| 申请号 |
US20010754841 |
申请日期 |
2001.01.03 |
| 申请人 |
CARL ZEISS SMT AG |
发明人 |
GERHARD MICHAEL;DIECKMANN NILS;SIELER CHRISTINE;ZEHETBAUER MARCUS;SCHRIEVER MARTIN;REISINGER GERD |
| 分类号 |
B08B7/00;G03F7/20;H01L21/027;(IPC1-7):G01N21/01;G01N21/51 |
主分类号 |
B08B7/00 |
| 代理机构 |
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