发明名称 HEAT-TREATING APPARATUS
摘要 A heat-treating apparatus comprising a reaction chamber accommodating an object to be treated, a heat-insulating body surrounding the reaction chamber, holes defined in the heat- insulating body, annular spacer members provided in the holes, and heater elements inserted in the annular spacer members.
申请公布号 KR20050086404(A) 申请公布日期 2005.08.30
申请号 KR20057001068 申请日期 2005.01.20
申请人 TOKYO ELECTRON LIMITED 发明人 SAITO TAKANORI;OSANAI HISAEI
分类号 H01L21/205;H01L21/324;(IPC1-7):H01L21/324 主分类号 H01L21/205
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