| 摘要 |
A RESIST COMPOSITION INCLUDING (A) A POLYMER USED IN A CHEMICALLY AMPLIFIED RESIST AND REPRESENTED BY THE FOLLOWING FORMULA: WHEREIN R1 IS SELECTED FROM THE GROUP CONSISTING OF -H AND -CH3, R2 IS SELECTED FROM THE GROUP CONSISTING OF T-BUTYL, TETRAHYDROPYRANYL AND 1-ALKOXYETHYL GROUPS, X IS AN INTEGER OF 1 TO 4, AND K/(K+L) IS 0.5 TO 0.9, AND (B) 1-15 % BY WEIGHT OF A PHOTOACID GENERATOR (PAG) ON THE BASIS OF THE WEIGHT OF THE POLYMER.
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