发明名称 VERTICAL MOS POWER TRANSISTOR
摘要 A transistor (10) such as a DMOS transistor is formed on a semiconductor substrate (12) with a first surface (19) for forming a channel (40). A gate dielectric (22) has a first thickness overlying a first portion of the channel, and a dielectric film (20) overlies a second portion of the channel and has a second thickness greater than the first thickness. The second thickness reduces the drain to gate capacitance of the transistor, thereby improving its switching speed and frequency response.
申请公布号 KR20050085490(A) 申请公布日期 2005.08.29
申请号 KR20057010473 申请日期 2003.10.14
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES, L.L.C. 发明人 VENKATRAMAN PRASAD
分类号 H01L29/08;H01L29/423;H01L29/739;H01L29/78 主分类号 H01L29/08
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