| 摘要 |
A method of forming a metal oxide film in accordance with plasma CVD process, comprising performing glow discharge in a low output region so as to carry out reaction wherein the main reactant is an organometal, and thereafter performing glow discharge in a high output region so as to carry out reaction between the organometal and an oxidative gas, thereby obtaining a plastic substrate and, sequentially superimposed on the surface thereof, an organic layer and a metal oxide film. This method enables forming a thin film of excellent adherence, softness and flexibility on the surface of a substrate such as a plastic in accordance with plasma CVD process.
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