| 摘要 |
In order to solve simultaneously the problems of scaly unevenness and beaded edge occurring in applying a photosensitive resin composition to a large substrate, a photosensitive resin composition comprising an alkali-soluble resin such as novolak and a photosensitizer having a naphthoquinonediazido group is incorporated with a silicone oil represented by the following general formula in an amount of 50 to 5,000ppm based on the whole solid matter of the composition: wherein R1, R2, R3, R4, R5 and R6 are each independently hydrogen, hydroxyl, C1-4 alkyl, or aryl; m is an integer of 1 to 40; and n is an integer of 1 to 40.
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