| 发明名称 |
GAS LAYER FORMATION MATERIALS |
| 摘要 |
The present invention provides gas layer formation material selected from the group consisting of acenaphthylene homopolymers; acenaphthylene copolymers; poly(arylene ether); polyamide; B-staged multifunctional acrylate/methacrylate; crosslinked styrene divinyl benzene polymers; and copolymers of styrene and divinyl benzene with maleimide or bis-maleimides. The formed gas layers (72) are used in microchips and multichip modules. |
| 申请公布号 |
KR20050084638(A) |
申请公布日期 |
2005.08.26 |
| 申请号 |
KR20057007807 |
申请日期 |
2005.05.02 |
| 申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
LI BO;ZHOU DE LING;NAMAN ANANTH;APEN PAUL |
| 分类号 |
C08G61/02;C08L65/00;H01L21/312;H01L21/316;H01L21/768;H01L23/522;H01L23/532;(IPC1-7):H01B3/36;H01B3/18 |
主分类号 |
C08G61/02 |
| 代理机构 |
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