| 摘要 |
The invention firstly relates to a device for the evaporative deposition of a high-temperature superconductor on a substrate in a vacuum, comprising a refilling device for housing a reservoir of high-temperature superconducting material, an evaporation device, which evaporates the high-temperature superconducting material in an evaporation zone, by means of a beam of an energy-transfer medium, a supply device for the continuous supply of the high-temperature superconducting material from the refilling device to the evaporation zone in such a manner that the high-temperature superconducting material supplied to the evaporation zone is evaporated essentially without residue. The invention further relates to a method for the evaporative deposition of a coating of a high-temperature superconducting material on a substrate in a vacuum, comprising the steps of the continuous introduction of a granulate of a high-temperature superconducting material into an evaporation zone and the operation of a beam of an energy transfer medium, such that the introduced granulate is evaporated in the evaporation zone essentially without a residue.
|
