发明名称 |
Method of making and structuring a photoresist |
摘要 |
A method of producing and structuring a UV 300/400 light sensitive highly viscous, chemically amplified positive photoresist which can be developed in an aqueous alkaline medium for application in layers of a thickness of 100 mum or more and which can be removed without leaving any residue, for use in micro systems technologies.
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申请公布号 |
US2005186500(A1) |
申请公布日期 |
2005.08.25 |
申请号 |
US20040947121 |
申请日期 |
2004.09.21 |
申请人 |
VOIGT ANJA;HEINRICH MARINA;GRUETZNER GABI |
发明人 |
VOIGT ANJA;HEINRICH MARINA;GRUETZNER GABI |
分类号 |
G03C1/492;G03F7/004;G03F7/039;(IPC1-7):G03C1/492 |
主分类号 |
G03C1/492 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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