发明名称 |
Method, system, and apparatus for management of reaction loads in a lithography system |
摘要 |
A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.
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申请公布号 |
US2005185163(A1) |
申请公布日期 |
2005.08.25 |
申请号 |
US20050110903 |
申请日期 |
2005.04.21 |
申请人 |
GALBURT DANIEL N. |
发明人 |
GALBURT DANIEL N. |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):G03B27/42 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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