发明名称 |
Process for the generation of intensive short wavelength plasma emissions for EUV lithography |
摘要 |
<p>The target generator [1] produces an injection jet [2] that is directed into a vacuum chamber [12]. An additional energy beam [32] and high energy beam [31] are introduced and interact with the target jet. The pulsed energy beams produce shock waves [26,27]resulting in plasma generation [41].</p> |
申请公布号 |
DE102004005242(A1) |
申请公布日期 |
2005.08.25 |
申请号 |
DE20041005242 |
申请日期 |
2004.01.30 |
申请人 |
XTREME TECHNOLOGIES GMBH |
发明人 |
GAEBEL, KAI;ZIENER, CHRISTIAN;HERGENHAN, GUIDO |
分类号 |
G21K5/08;G03F7/20;G21B1/00;H01L21/027;H05G2/00;(IPC1-7):H05G2/00 |
主分类号 |
G21K5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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