发明名称 SEMICONDUCTOR MEMORY AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory, having low-resistance gates suited for a memory cell array layout. SOLUTION: The nonvolatile semiconductor memory has a split gate structure of memory gates. The memory gate is, if formed with sidewall spacers, made of polysilicon and it is substituted by nickel silicide. This reduces the resistance, without giving influences on turning into silicide of selected gates or a diffusion layer. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005228786(A) 申请公布日期 2005.08.25
申请号 JP20040033297 申请日期 2004.02.10
申请人 RENESAS TECHNOLOGY CORP 发明人 HISAMOTO MASARU;YASUI KAN
分类号 H01L21/8247;H01L21/00;H01L21/28;H01L21/336;H01L21/8242;H01L27/105;H01L27/115;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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