发明名称 |
METHOD AND APPARTUS FOR HIGH SPEED THICKNESS MAPPING OF PATTERNED THIN FILMS |
摘要 |
An apparatus or method captures reflectance spectrum for each of a plurality of spatial locations on the surface of a patterned wafer. A spectrometer system having a wavelength-dispersive element receives light reflected from the locations and separates the light into its constituent wavelength components. A one-dimensional imager scans the reflected light during translation of the wafer with respect to the spectrometer to obtain a set of successive, spatially contiguous, one-spatial dimension spectral images. A processor aggregates the images to form a two-spatial dimension spectral image. One or more properties of the wafer, such as film thickness, are determined from the spectral image. The apparatus or method may generate a wavelength-dependent correction factor to correct for diffraction errors introduced in reflectance spectra by the wavelength-dispersive element. The invention provides for automatic rotation of a patterned wafer to determine Goodness of Alignment during a measurement process. The invention may include a dual Offner optical system disposed between the wafer and imager. |
申请公布号 |
WO2005077135(A2) |
申请公布日期 |
2005.08.25 |
申请号 |
WO2005US05205 |
申请日期 |
2005.02.11 |
申请人 |
FILMETRICS, INC.;CHALMERS, SCOTT A.;GEELS, RANDALL S. |
发明人 |
CHALMERS, SCOTT A.;GEELS, RANDALL S. |
分类号 |
G01B11/06;G01J3/02;G01J3/28;G01J3/36;G01N21/21;G01N21/27;G01N21/47;G01N21/55;G01N21/84;G01N21/95;G01N21/956;G03F7/20 |
主分类号 |
G01B11/06 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|