POSITIVE-WORKING PHOTORESIST COMPOSITION AND RESIST PATTERNING METHOD USING SAME,申请号KR20010052726-传众专利搜索

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发明名称	POSITIVE-WORKING PHOTORESIST COMPOSITION AND RESIST PATTERNING METHOD USING SAME
摘要
申请公布号	KR100510020(B1)	申请公布日期	2005.08.25
申请号	KR20010052726	申请日期	2001.08.30
申请人		发明人
分类号	G03F7/039;C08F2/44;C08F257/00;C08K5/00;C08K5/09;C08K5/17;C08L25/18;G03F7/004;G03F7/40;H01L21/027;(IPC1-7):G03F7/039;G03F1/08	主分类号	G03F7/039
代理机构		代理人
主权项
地址

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