发明名称 IMAGING OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
摘要 <p>An imaging optical system capable of keeping a good imaging performance for an extended period substantially free from effect by compaction and damage by immersion liquid while ensuring a large effective image-side numerical aperture by interposing liquid in an optical path between the system and an image surface. When the refractive index of an atmosphere in an optical path in the imaging optical system is 1, an optical path between the imaging optical system and a second surface (W) is filled with a liquid (Lm) having a refractive index larger than 1.1. A joint optical member (Lb) formed by joining a first optical member (Lb1) formed of a first optical material and contacting the liquid with a second optical member (Lb2) formed of a second optical material is disposed on the side closest to the second surface in the imaging optical system. The condition, 0.1&lt;TA/IH&lt;1.1, is satisfied when the thickness of the first optical member is TA and a maximum image height at the second surface is IH.</p>
申请公布号 WO2005078773(A1) 申请公布日期 2005.08.25
申请号 WO2005JP01317 申请日期 2005.01.31
申请人 NIKON CORPORATION;OMURA, YASUHIRO;INOUE, RYUICHI;SHINKAI, MASAHIKO 发明人 OMURA, YASUHIRO;INOUE, RYUICHI;SHINKAI, MASAHIKO
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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