| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a levitation substrate transfer processing method which can reduce the size and simplify the structure of its apparatus, and can be improved in the processing efficiency and performance, and also to provide the apparatus. <P>SOLUTION: The levitation substrate transfer processing apparatus comprises a leviation stage 22, above which a substrate G is levitated by a gas, resist supply nozzle 23 for supplying a processing liquid in a belt-like pattern onto the surface of the substrate G; nozzle-elevating mechanism 90 for moving the resist supply nozzle up and down; a substrate-holding means 24 which detachably sucks and holds both side edges of the substrate and can be displaced according to the levitated height of the substrate; a linear motor 27 for moving sliders 26 connected to the substrate holding means along guide rails 25, arranged in parallel to both sides of the levitation stage; an optical sensor 50 for detecting the distance between a substrate immediately before treatment and the resist supply nozzle; and a CPU 70 for controlling the distance between the substrate and the resist supply nozzle, by correcting the holding height of the substrate holding means, based on the information about the preliminarily measured levitation height of the substrate, to control the horizontal position of the substrate, and moving the resist supply nozzle vertically, based on the detection signal from the optical sensor. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
