| 摘要 |
Disclosed is an exposure apparatus and a device manufacturing method using the same, wherein the exposure apparatus has an original stage being movable while carrying an original thereon, and a projection optical system for projecting a pattern of the original onto a substrate. The original stage includes a first holding portion for holding the original and having a first surface for positioning the original, and a second holding portion for holding the original and having a second surface to be contacted to the original. Here, the second surface is made elastically or resiliently deformable. |
