RESIST IMAGE FORMING MATERIAL AND RESIST IMAGE FORMING METHOD FOR THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a resist image forming material which exhibits high resolution and is excellent also in production stability when a photopolymerizable composition layer sensitive to blue-violet light in the resist image forming material is exposed by a direct drawing method and developed to form a resist image, and also to provide a resist image forming method for the same.

SOLUTION: The resist image forming material has a layer of a photopolymerizable composition sensitive to blue-violet light on a substrate to be worked, wherein a content of an antioxidant in the photopolymerizable composition is 10-500 ppm. In the resist image forming method, the photopolymerizable composition layer of the resist image forming material is exposed by a direct drawing method and developed.

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