发明名称 APPLICATION AND DEVELOPMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To facilitate work operations from substrate processing to inspection, to reduce the time needed for the work operations, and to perform inspection, without reversing the transport flow of substrates. SOLUTION: This apparatus is composed of a cassette station, including a placing section where substrate cassettes containing multiple cassettes are placed, and delivery means that delivers substrates; application unit that applies resist liquid to substrates that have been transferred from the cassette station; treatment station including a development unit that provides developer solution to substrates after exposure; inspection section that inspects the status of the substrates after development processing, such as measurement of the development line width. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005229131(A) 申请公布日期 2005.08.25
申请号 JP20050107672 申请日期 2005.04.04
申请人 TOKYO ELECTRON LTD 发明人 SATO NORIKATSU;KIMURA YOSHIO;KAMIYA HIDEHIKO
分类号 H01L21/677;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 H01L21/677
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