Monitoring device for application of adhesive to substrate has radiation source with elliptical reflector directing radiation linearly on to substrate

摘要

The monitoring device monitors the application of adhesive to a substrate such as a block spine (2). It has a linear radiation source (5), and the linear radiation detection. The adhesive layer is affected by the radiation. The radiation source has an elongated elliptical reflector (6), directing radiation linearly onto the substrate. An evaluation device (14) compares the picture point signal with a preset intended value to differentiate between regions to which an adhesive has and has not been applied.