COPPER FILM VAPOR PHASE DEPOSITION METHOD,申请号KR20020036202-传众专利搜索

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发明名称	COPPER FILM VAPOR PHASE DEPOSITION METHOD
摘要
申请公布号	KR100510039(B1)	申请公布日期	2005.08.25
申请号	KR20020036202	申请日期	2002.06.27
申请人		发明人
分类号	C23C14/22;C23C16/08;C23C16/14;C23C16/448;H01L21/285;(IPC1-7):C23C14/22	主分类号	C23C14/22
代理机构		代理人
主权项
地址

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