发明名称 |
Method of an array of structures sensitive to ESD and structure made therefrom |
摘要 |
A method of fabricating an array of structures sensitive to ESD is disclosed. First, an array of structures is provided on a substrate, with the structures conductively coupled by interconnections. Thereafter, the interconnections are removed before fabricating another array of structures. Therefore, the structures have equal potential. Further, an electrostatic discharge structure is provided near the periphery of the substrates.
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申请公布号 |
US2005186715(A1) |
申请公布日期 |
2005.08.25 |
申请号 |
US20050040747 |
申请日期 |
2005.01.24 |
申请人 |
TOPPOLY OPTOELECTRONICS CORP. |
发明人 |
CHEN JR-HONG;LIN GWO-LONG;CHEN CHIH-FANG |
分类号 |
G02F1/1368;G02F1/1362;G09F9/30;H01L21/00;H01L21/28;H01L21/3205;H01L21/77;H01L21/82;H01L21/84;H01L27/02;H01L27/12;H01L29/786;(IPC1-7):H01L21/00 |
主分类号 |
G02F1/1368 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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