发明名称 METHOD OF EVALUATING SILICON-BASED THIN FILM FOR SOLAR CELL, AND METHOD FOR MANUFACTURING THE SOLAR CELL
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of evaluating a silicon-based thin film for a solar cell, for analyzing the film quality of the silicon-based thin film formed on a substrate which does not allow infrared rays from passing. <P>SOLUTION: In the method of evaluating the silicon-based thin film for the solar cell, infrared rays 10 are emitted to an amorphous silicon thin film 3, that is formed on a transparent glass substrate 5, such as soda glass for preventing infrared rays from being transmitted, and is used for the solar cell, and an absorption spectrum 17 of reflected waves reflected by the amorphous silicon-based thin film 3 is analyzed, thus estimating a light-degradation ratio in the amorphous silicon thin film 3. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005228993(A) 申请公布日期 2005.08.25
申请号 JP20040037408 申请日期 2004.02.13
申请人 MITSUBISHI HEAVY IND LTD 发明人 TAKANO GIYOUMI;MORI SHINICHIRO
分类号 G01N21/27;G01N21/35;G01N21/3563;G01N21/552;H01L31/04;(IPC1-7):H01L31/04 主分类号 G01N21/27
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