发明名称 VARIABLE MOLDING CHARGED BEAM ADJUSTING METHOD, PHOTOMASK MANUFACTURING METHOD AND PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a variable molding charged beam adjusting method, with which a proper molding gain can be easily determined. <P>SOLUTION: A variable molding charged beam adjusting method includes: a step S1 for preparing a substrate with a resist provided on its surface; steps S2, S3 for plotting a plurality of patterns, having different sizes and the same area on the resist by beam radiation of a variable molding beam type, based on plotting data of the plurality of patterns; a step S4 for developing the resist and forming a plurality of resist patterns corresponding to the plurality of patterns on the substrate; a step S5 for measuring dimensions of the plurality of resist patterns; and a step for adjusting a molding gain so that each of the dimensions of the plurality of resist patterns becomes a predetermined dimension. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005228914(A) 申请公布日期 2005.08.25
申请号 JP20040036212 申请日期 2004.02.13
申请人 TOSHIBA CORP;DAINIPPON PRINTING CO LTD 发明人 KONDO TAKEHIRO
分类号 G03F1/68;G03F1/76;G03F1/78;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 主分类号 G03F1/68
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