| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide constructive thickness measuring device and method by an in-situ process for determining the thickness of a thin film, an ashing speed and an end point. <P>SOLUTION: There is included a room having a primary visual field port 126 and a secondary visual field port 127. The primary visual field port 126 includes light receiving means 116 in the shape of receiving a light at a shallow angle from the front surface of a substrate to be treated. The secondary visual field port 127 includes a broad band lighting luminous source, and is preferably arranged at a side wall facing to the light receiving means 116. This treatment comprises a step of calculating the thickness of the thin film, the ashing speed and the end point from an interference pattern. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
