发明名称 Integrated circuit with electrostatic discharge (ESD) resistant capacitor located in N-trough, with certain polarity of capacitor permitting formation depletion zone in trough and high ESD strength of capacitor
摘要 <p>Integrated circuit (10) contains reference operational potential line (18), under basic potential in specified strength. Between both potential lines is fitted capacitor (12) with specified zones. Specified zones include main doping region (20), coupling region (22,24) with main type doping and electrode region (30) spaced from main doping region. Between electrode and main doping regions is deposited dielectric (28). Further details are specified. An independent claim is also included for method of manufacturing integrated circuits with capacitors.</p>
申请公布号 DE102004006484(A1) 申请公布日期 2005.08.25
申请号 DE20041006484 申请日期 2004.02.10
申请人 INFINEON TECHNOLOGIES AG 发明人 RUSS, CHRISTIAN;GOSSNER, HARALD;SCHNEIDER, JENS;ESMARK, KAI
分类号 H01L27/08;H01L29/94;(IPC1-7):H01L27/08;H01L21/822;H01L23/62 主分类号 H01L27/08
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