发明名称 DRIVE METHOD, EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <p>A stage is moved so that the same target operation is performed when acquiring first shift information (data 1) on a stage in the first state having no liquid immersion region formed on the stage (step 116) and when acquiring second shift information (data 3) on a stage in the second state having no liquid immersion region formed on the stage (step 122). In this case, the difference between the first shift information and the second shift information is information directly reflecting the difference between the first state and the second state. When performing exposure, the stage shift is controlled considering the correction information calculated according to the first shift information and the second shift information (step 126). Accordingly, it is possible to control the stage so that no error attributed to presence/absence of a liquid immersion region on the stage is caused. Thus, it is possible to improve the position control of a moving body.</p>
申请公布号 WO2005078777(A1) 申请公布日期 2005.08.25
申请号 WO2005JP02216 申请日期 2005.02.15
申请人 NIKON CORPORATION;MIZUTANI, TAKEYUKI 发明人 MIZUTANI, TAKEYUKI
分类号 G03F7/20;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F7/20
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