| 摘要 |
<P>PROBLEM TO BE SOLVED: To manufacture a vibration-type gyro sensor element that is compact and has high sensitivity, and has a cantilever-type vibrator. <P>SOLUTION: A first protective film pattern having a first opening comprising a straight line, in parallel with or vertical to ä110} plane is formed on one main surface of a single-crystal silicon substrate 1, in which the orientation of one main surface or other main surfaces is ä100}. Crystal anisotropic etching is made to the first opening so that the thickness of the vibrator 11 is reached, a straight line in parallel with or vertical with respect to ä110} plane is composed on other main surfaces, in which a lower electrode 4a, a piezoelectric thin film 5a, and upper electrodes 6a, 6b, 6c are formed. A second protective film pattern, having a second opening in which a gap with the vibrator 11 as a cantilever shape has been cut out, is formed, and reactive ion etching is made to the second opening, thus forming the vibrator 11. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
