| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography equipment, comprising measuring means for measuring the displacement of a direction which is orthogonal to the scanning direction in the mask stage or the wafer stage of a scanning-type exposure device. SOLUTION: A beam emitted from a beam source 17, fixed to a frame 15 is divided into two beams by a reflecting slit 26 fixed to a stage. Further, the beams are transmitted through transmission type second slits 18 and 19, third slits 24 and 25, and 1/4 wavelength plates 22 and 23. Then the beams are made into a single beam by the reflecting slit 26. The beam is made to be incident into a sensor. The sensor senses variation in the strength of the interference of the beam and measures the variational amount for the stage. COPYRIGHT: (C)2005,JPO&NCIPI
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