CRYSTALLINE SEMICONDUCTOR FILM AND ITS MANUFACTURING METHOD, SEMICONDUCTOR ELEMENT, LIQUID CRYSTAL DISPLAY, LOGIC CIRCUIT, ELECTRONIC EQUIPMENT, AND SPRAYING DEVICE

摘要

PROBLEM TO BE SOLVED: To suppress a decrease in process-uniformity effected by a droplet from a spray nozzle and to easily improve a uniformity of a mist diameter at a low cost when adding a catalytic element solution to an amorphous semiconductor film. SOLUTION: In manufacturing a crystalline semiconductor film including a silicon, when spraying and adding the mist catalytic element solution 3 to the surface of the amorphous semiconductor thin film on a glass substrate 6 held by a processing stage 2 with a spraying nozzle 4 of the spraying device 1 by a spray-processing method, the spray is conducted in a direction including a vector in an opposite direction (an upward direction) against a direction of gravitational force. COPYRIGHT: (C)2005,JPO&NCIPI